Chifeng Shengsen Silicon Technology Development Co., Ltd.
Name:Chifeng Shengsen Silicon Technology Development Co., Ltd.
Type:Others
Tel:05345011648
Fax:
Address:China(Mainland)
Products detail
Product Name: nano silica
CAS No:
Product Type: Inorganic Chemicals -> Inorganic oxides
Product spec: ss300
Packing:
Post Time: 2016-03-28
Usage: fumed silica with BET surface 200m2/g, it is one kind of inorganic refine chemical white color, none toxic , no taste, amorphous ,fluffy powder . it is one special nano -grade material in industry. Produced via flame hydrolysis. All untreated fumed silica are characterized by: High purity Aggregated structure Submicron particle size Low bulk density Hyhilic surface chemistry
Description: Hyhilic fumed silica Product name: SS®300 CAS NO 112945-52-5 SYNONYMS: fumed silicon dioxide Physical Deion: Fumed Silica is composed of submicron-sized spheres, which are 40-60% fused into short chains, very highly branched,0.1-0.2microns long. The spheres are quite uniform in size for a given product, but the chain lengths are quite variable,10 to 30 units in length. The surface area, which varies with the particle size, gives a good approximation if the sphere diameter. The smaller the particles, the larger the estimated surface area. SS® 300 is a hyhilic fumed Silica with specific surface area of 150m2/g, and it synthetic, hyhilic, amorphous silica, produced via flame hydrolysis. Particle between 7~40nm. Along with the traditional polyester, silicone, paints and coatings applications, hyhilic SS® 300 products are used with increasing success in high technology fields. The particle nature and high purity of fumed silica play key roles in the electronics and optical fibers industries. Physical-chemical Data Properties units Typical Value Standard Appearance Fluffy white powder Specific surface area(BET) m2/g 300±30 GB/T20020 PH-value (in 4% dispersion) 3.7-4.5 GB/T20020 Loss on heating ,ex works(2h@105℃) Wt% ≤2.0 GB/T20020 Loss on ignition(2h@1000℃,based on material dried for 2h@105℃) Wt% ≤2.0 GB/T20020 Sieve residue (45μm) Mg/kg ≤250 GB/T20020 SiO2 content(based on the substance heated at 1000℃ ) Wt% ≥99.8 GB/T20020 Tamped density (based on material dried for 2h@105℃ ) g/L ≤50 GB/T20020 Carbon content(based on material dried for 2h@105℃ ) Wt% ≤0.2 GB/T20020 Al2O3 mass fraction, mg/kg ≤400 GB/T20020 TiO2 mass fraction, mg/kg ≤200 GB/T20020 Fe2O3 mass fraction, mg/kg ≤30 GB/T20020 Chloride content mg/kg ≤250 GB/T20020
Inquiry
Recipient: zou Company: Chifeng Shengsen Silicon Technology Development Co., Ltd.
Title: *    
Content: *
Contact
Name: * Company: *
Tel: * E-Mail: *
Fax: WebSite:
  
Copyright©Chemamde Contact us Tel:05345011648 Fax: